Precision-welded quartz side arm on a high-purity fused silica bell jar, showing fire-polished finish.
Close-up of internal quartz gas distributor showerhead inside a semiconductor reaction chamber.
Close-up of internal quartz gas distributor showerhead inside a semiconductor reaction chamber.
Custom fused silica quartz bell jar with integrated gas inlet arm for CVD reactor.
Custom fused silica quartz bell jar with integrated gas inlet arm for CVD reactor.

Quartz Bell Jar with Gas Inlet for CVD Reaction Chambers

Upgrade your semiconductor processing with our high-purity fused silica quartz bell jars. Specifically designed for CVD (Chemical Vapor Deposition) and plasma reaction environments, these chambers offer exceptional thermal stability and chemical resistance. Each unit features a precision-welded gas inlet side arm and an integrated internal distributor to ensure uniform gas flow across the wafer surface. Whether you are scaling up production or conducting R&D, our CNC-machined quartz solutions provide the vacuum integrity and purity your process demands.

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MarcaLianyungang Tuguan cuarzo fundido
Nombre de la producciónQuartz Bell Jar with Gas Inlet
Material99.99% cuarzo puro
Espesor0.2-100mm
Servicio de procesamientoDoblado, Soldadura, Punzonado, Corte, Moldeo
Colortransparente
Tamañopersonalizado
Surface Quality60/40
AplicaciónÓptica/Semiconductores/Industria
Densidad2.2×103 kg/m3Dureza5.5 – 6.5 Mohs’ Scale 570 KHN 100
Resistencia a la tracción de diseño4.8×107 Pa (N/m2) (7000 psi)Design Compressive StrengthGreater than 1.1 x l09 Pa (160,000 psi)SMD 5730
Bulk Modulus3.7×1010 Pa (5.3×106 psi)Rigidity Modulus3.1×1010 Pa (4.5×106 psi)
Softening Point1730°CAnnealing Point1215°C
Close-up of internal quartz gas distributor showerhead inside a semiconductor reaction chamber.
  • Ultra-High Purity Material: Made from 99.99% (4N) SiO2 to minimize metallic impurities and prevent wafer contamination.
  • Precision Gas Distribution: Integrated internal perforated plate (showerhead) for optimized gas flow dynamics.
  • Extreme Thermal Resistance: Stable performance at continuous operating temperatures up to 1100°C, with a softening point of 1730°C.
  • Superior Vacuum Sealing: Fire-polished or CNC-ground bottom flanges ensure a leak-tight seal for vacuum applications.
  • Custom Geometric Complexity: Expertise in complex glass-to-glass welding and side-arm integration according to your specific reactor design.
  • Close-up of internal quartz gas distributor showerhead inside a semiconductor reaction chamber.
  • Close-up of internal quartz gas distributor showerhead inside a semiconductor reaction chamber.
  • Custom fused silica quartz bell jar with integrated gas inlet arm for CVD reactor.
  • Custom fused silica quartz bell jar with integrated gas inlet arm for CVD reactor.

Preguntas frecuentes

We primarily use high-purity fused silica with 99.99% SiO2 content. For extremely sensitive processes, we can source synthetic quartz (JGS1) to further reduce trace metal concentrations.

All joints undergo a secondary annealing process in a high-temperature furnace to remove internal stress, significantly reducing the risk of cracking during thermal cycling.

Each part undergoes an ultrasonic acid wash followed by Deionized (DI) water rinsing. They are double-bagged in a cleanroom environment before secure wooden crate packaging.

Yes, our technical team specializes in translating STEP, DWG, or PDF drawings into precise quartz components with tolerances as tight as ±0.1mm.

We can produce custom bell jars up to 600mm in diameter, depending on the wall thickness and complexity of the side attachments.

What is the typical lead time for a custom reaction chamber?

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